Chelsea Search Group, Inc.
IC Layout Designer (TSMC FinFET)
Chelsea Search Group, Inc., San Diego, California, United States, 92189
IC Layout Designer
Full-time + Benefits.
US Citizen or US Permanent Resident.
Richardson, Texas (onsite/hybrid) or remote from any US location.
Requirements
3+ years of experience in Cadence layout (Virtuoso, VXL) and Calibre verification (ERC, DRC, LVS).
3+ years of experience in layout and verification tools and methodologies for RF/Analog/Mixed-Signal ICs.
BSEE or AA degree.
TSMC FinFET experience in advanced technology nodes (7nm and below).
Comprehensive understanding of matching, shielding, guard rings and latch‑up.
Debugging and analytical skills with complex technical concepts.
Demonstrated success in delivering quality work product.
Experience in DFM hierarchical layout construction for efficient verification and integration.
Must understand techniques for managing layout dependent effects i.e., IR drop, RC delay, electron migration, self-heating and crosstalk.
Proficiency in PERL or SKILL scripting is a plus.
Strong verbal and written communication.
IC MASK LAYOUT DESIGN GROUP on LinkedIn: https://www.linkedin.com/groups/13537705/
#J-18808-Ljbffr
US Citizen or US Permanent Resident.
Richardson, Texas (onsite/hybrid) or remote from any US location.
Requirements
3+ years of experience in Cadence layout (Virtuoso, VXL) and Calibre verification (ERC, DRC, LVS).
3+ years of experience in layout and verification tools and methodologies for RF/Analog/Mixed-Signal ICs.
BSEE or AA degree.
TSMC FinFET experience in advanced technology nodes (7nm and below).
Comprehensive understanding of matching, shielding, guard rings and latch‑up.
Debugging and analytical skills with complex technical concepts.
Demonstrated success in delivering quality work product.
Experience in DFM hierarchical layout construction for efficient verification and integration.
Must understand techniques for managing layout dependent effects i.e., IR drop, RC delay, electron migration, self-heating and crosstalk.
Proficiency in PERL or SKILL scripting is a plus.
Strong verbal and written communication.
IC MASK LAYOUT DESIGN GROUP on LinkedIn: https://www.linkedin.com/groups/13537705/
#J-18808-Ljbffr