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JSR Micro

R&D Intern

JSR Micro, Sunnyvale, California, United States, 94086

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Internship Opportunity at JSR

At JSR, interns are more than just studentsthey are valued contributors to our mission of advancing semiconductor technology through innovative materials and solutions. Our internship program is designed to provide meaningful, hands-on experience in a collaborative and globally connected environment. As a JSR intern, you will: Work on real projects

contribute to active projects that impact product development, quality, and customer success. Gain technical & industry exposure

learn directly from experienced engineers, scientists, and business professionals in the semiconductor materials industry. Build your professional network

connect with peers, mentors, and leaders across departments and international teams. Explore career opportunities

discover potential career paths at JSR and gain insight into full-time roles and global mobility opportunities. Develop key skills

strengthen your problem-solving, communication, and project management skills in a supportive environment. Our interns are curious, driven, and eager to learn. If you're passionate about innovation and excited to make an impact, we invite you to explore internship opportunities with JSR. JSR is now hiring a 12-week intern to support the Technology Team in advancing greener, PFAS-free photoresist development for semiconductor applications. This hands-on role will focus on the formulation and characterization of photoresist materials, with an emphasis on understanding fundamental Deep Ultraviolet (DUV) lithography performance. The selected candidate will gain foundational knowledge of PFAS-free resist chemistry and contribute to JSR's sustainability initiatives in next-generation photolithography materials. What you'll do: Prepare 510 PFAS-free photoresist formulations per day, following detailed process protocols. Apply formulations onto silicon wafers using spin-coating tools in a cleanroom environment. Perform film characterization measurements, including film thickness (FT) analysis using ellipsometry or reflectometry. Analyze and interpret key photoresist propertiessuch as DUV absorption behaviorin relation to lithographic performance. Accurately document formulation parameters, processing conditions, and test results in lab notebooks or digital tracking systems. Collaborate with senior engineers to troubleshoot formulation challenges and optimize material performance. Maintain a clean, organized lab environment and adhere to all safety and chemical handling protocols. What you bring: Currently pursuing a Bachelor's or Master's degree in Chemistry, Chemical Engineering, Materials Science, or a related field. Basic understanding of organic or polymer chemistry; coursework or lab experience in formulation is a plus. Hands-on experience with laboratory tools and techniques; cleanroom or spin-coating experience preferred but not required. Familiarity with thin film characterization methods (e.g., ellipsometry, reflectometry) is a strong advantage. Strong attention to detail and commitment to following precise protocols. Ability to analyze data, interpret results, and communicate findings clearly. Eagerness to learn, collaborate, and contribute to sustainability-focused R&D. Excellent organizational skills and ability to maintain clear, accurate lab records. Commitment to safety and responsible chemical handling practices. Salary range: $25.00 to $30.00 per hour (Based on skills, experience, and location) Equal opportunity employer. JSR is an Equal Employment Opportunity and Affirmative Action Employer. We consider all qualified applicants without regard to race, color, religion, sex, sexual orientation, gender identity or expression, national origin, age, marital status, veteran status, or disability status. Third-party agencies. Recruitment agencies or headhunters: Please do not submit resumes/CVs through our website or directly to managers. JSR does not accept unsolicited resumes from agencies without a signed agreement and will not pay fees for such submissions.